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Seed Treatment with Nitric Oxide–Releasing Nanoparticles to Enhance Germination and Stress Tolerance

Title:

PROCESS FOR SEED TREATMENT WITH NITRIC OXIDE-RELEASING NANOPARTICLES FOR THE PROMOTION OF PLANT GROWTH, DEVELOPMENT, AND STRESS PROTECTION

Type of protection: Innovation Patent

Registration number: BR10202400134

Registration institution: Instituto Nacional da Propriedade Industrial (National Institute of Industrial Property – INPI, Brazil)

Filing date: 23/01/2024

Assignees: Universidade Estadual de Londrina (State University of Londrina – UEL, Brazil) Universidade Federal do ABC (Federal University of ABC – UFABC, Brazil)

Inventors:

  • Prof. Halley Caixeta Oliveira – State University of Londrina (UEL)
  • Prof. Amedea Barozzi Seabra – Federal University of ABC (UFABC)
  • Prof. Claudemir Zucareli – UEL
  • Diego Genuário  Gomes – UEL
  • André Sampaio Ferreira – UEL
  • Beatriz Larissa de Souza – UEL
  • Joana C. Pieretti – UFABC

 

Abstract: This invention describes a seed-treatment method using nanoencapsulated nitric oxide (NO) donors, combining the benefits of seed priming with the controlled release of NO through nanotechnology. The treatment enhances seed vigor and seedling establishment under both optimal and stress conditions, with long-lasting physiological benefits extending beyond germination. The approach is cost-effective, environmentally benign, and employs biodegradable, biocompatible materials, contributing to sustainable crop productivity under climate-stress scenarios.

Aplication:

Nitric Oxide-Releasing Nanoparticles: Making Plants More Drought-Resilient 

Status: Filled

Contact: halley@uel.bramedea.seabra@ufabc.edu.br 

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